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Tungsten sputtering target
(10)
Customized Tungsten Sputtering Material Target with Melting Point of 3422°C
Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
Product Description: The Tungsten sputtering target boasts a surface finish of Ra < 0.8 μm, ensuring that the film deposited by the sputtering process is smooth and even. The target's hardness of 7.5 Mohs ensures that it is highly resistant to wear and can withstand repeated use without degrading... View More
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Tungsten sputtering target Thermal Conductivity 173 W/mK Round without coating
Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
Product Description: The Tungsten sputtering target is an essential tool for the application of thin films in a wide range of industries, including the semiconductor, aerospace, and medical industries. This Tungsten physical vapor deposition target is used to deposit a thin layer of Tungsten on a su... View More
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Melting Point 3422°C Tungsten Sputter Coating Target for Advanced Coating
Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
The Tungsten sputtering target is an essential component in the thin film deposition process. It is used to coat a variety of surfaces with a thin film of tungsten. The tungsten thin film has excellent adhesion and a high melting point, making it an ideal solution for applications that require a hig... View More
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Customized Tungsten Sputtering Target with Indium Bonding and 7.5 Mohs Hardness
Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
Product Description: The Tungsten sputtering target is an essential component in the thin film deposition process. It is used to coat a variety of surfaces with a thin film of tungsten. The tungsten thin film has excellent adhesion and a high melting point, making it an ideal solution for applicatio... View More
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Customized Tungsten Thin Film Sputter Target with 19.3 G/cm3 Density
Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
Product Description: Our tungsten PVD target material is designed to deliver exceptional results in a wide range of thin film deposition applications. Whether you are working in the semiconductor industry, the optics industry, or any other field where thin film coatings are required, our tungsten th... View More
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Indium Bonding Tungsten Sputtering Target for Thin Film Deposition Ra 0.8 μm
Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
Product Description: Our sputtering target is made of high-quality Tungsten material with a hardness of 7.5 on the Mohs scale, making it an ideal choice for applications that require high durability and resistance to wear and tear. Featuring Indium Bonding, our Tungsten thin film sputter target deli... View More
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Tungsten Thin Film Deposition Target for Round Substrate Deposition Techniques
Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
Product Description: The Tungsten thin film vacuum deposition target is designed with the highest quality standards to ensure consistent and reliable performance. The product is made of pure tungsten, which is a strong, durable, and highly resistant material. The product has a density of 19.3 G/cm3,... View More
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Ra 0.8 μm Tungsten Sputtering Target with Indium Bonding and 173 W/mK Thermal Conductivity
Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
Product Description: The Tungsten PVD target material is available in customized sizes to fit your specific needs. Whether you require a large target for industrial applications or a small target for research purposes, we can provide a size that meets your requirements. The target bonding is done wi... View More
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Round Tungsten Sputtering Target W 99.95% High Purity High Density Density 19.3 G/cm3
Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
Product Description: The Tungsten sputtering target is available in customized sizes, which can be tailored as per the customer's requirements. The size of the target is an important factor that affects the efficiency and quality of the sputtering process. Therefore, the Tungsten sputtering material... View More
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Melting Point 3422°C Tungsten Sputtering Target for Advanced Thin Film Deposition
Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
Product Description: With a hardness of 7.5 Mohs, the Tungsten sputtering target is highly durable, ensuring long-lasting performance and minimizing the need for frequent replacements. Its superior hardness also makes it an ideal choice for use in high-energy sputtering processes, resulting in high ... View More
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